IBM looks at mathematical techniques to help overcome lithography obstacles at 22 nm

  • In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM has announced the semiconductor industry's first computationally based process for production of next generation 22 nm semiconductors. Known as computational scaling (CS), this new initiative will feature support from several of IBM's key partners initially including Mentor Graphics and Toppan Printing.

    More here at Digitimes.

Related Stories

6 Ways to Protect Yourself on the Internet

How to recover deleted videos on android

Why should you choose to make use of Pallet Racking Systems?