IBM looks at mathematical techniques to help overcome lithography obstacles at 22 nm

Posted by Digitimes

In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM has announced the semiconductor industry's first computationally based process for production of next generation 22 nm semiconductors. Known as computational scaling (CS), this new initiative will feature support from several of IBM's key partners initially including Mentor Graphics and Toppan Printing.

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