Intel's first high-volume 45nm fab goes online

Posted by Rick C. Hodgin

Chandler (AZ) - Intel officially opened its first 45nm high-volume facility in Chandler, Arizona today.  Dubbed Fab 32, this $3 billion facility is Intel's 6th 300mm fab facility, and is technically its second 45nm facility with a developmental fab dubbed D1D in Hillsboro, Oregon being the first.  Intel will manufacture its next-generation line of Penryn microprocessors at this facility.  Penryn is the code-named for Intel's upcoming processors, set to be released on November 11, 2007.

TG Daily was on hand at Fall IDF 2007 in San Francisco, CA, and was able to see some of the upcoming microprocessors for 2008, including Silverthorne, Moorestown and Nehalem.  Intel's 45nm process fabrication technology differs from its 65nm process technology.  Intel discovered in 2003 a hafnium-based solution which has the potential to decrease gate leakage by a factor of 10 over traditional process methods.  Combined with a new metal gate, the 45nm process technology is the first to employ a hafnium-based solution in wide-scale production.  All of Intel's 45nm processors will be arriving with this new technology.  Fab 32 has more than 1 million square feet of space with 184,000 square feet of clean room space.  It employs more than 1,000 people.

Read more ... Intel press release.