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1. Stretching the limits of lithography: MIT creates 25 nm structures

   (Trendwatch/Trendwatch Features)

   Tuesday, 08 July 2008

   ... with the switch to sub-100 nm structures. Today we are at 45 nm and the industry is still using DUV to print its chips. Both Intel and IBM are experimenting with EUV and indicated that a switch may now ...

2. AMD reports successful production of full-field EUV test chip

   (Hardware/Hardware Features)

   Tuesday, 26 February 2008

   Researchers from AMD and IBM apparently have reached a milestone in advancing chip production technology, creating a path to semiconductors with structures of 16 nm and smaller. San Jose (CA) – Researchers ...

3. AMD and IBM promise more performance for 45 nm processors

   (Hardware/Hardware Features)

   Tuesday, 12 December 2006

   AMD and IBM presented first details of its 45 nm production process at the International Electron Device Meeting (IEDM) today. While practical data for the consumer remains scarce, the two companies indicated ...

4. ArF laser light source to enable production of sub-45 nm semiconductors

   (Trendwatch/Trendwatch Features)

   Wednesday, 05 July 2006

   ... 32 nm processors in or around 2009. However, IBM recently showed 29.9 nm structures that were created with the help of "high-index immersion".  ...

5. IBM drives chipmaking process beyond current limitations

   (Trendwatch/Trendwatch Features)

   Tuesday, 21 February 2006

   IBM researchers claim to have found a way to use deep-ultraviolet (DUV) lithography techniques for the production of 32 nm chips and smaller. The limits of DUV have been pushed out several times and saved ...